Fujifilm Participates in “SEMICON India 2024”, an International Exhibition of Semiconductor Manufacturing Equipment and Materials in India

September 3, 2024 -- FUJIFILM Corporation will participate in “SEMICON India 2024”, an international exhibition of semiconductor manufacturing equipment and materials, to be held in New Delhi, India, from September 11 to 13, 2024.

Fujifilm offers semiconductor materials used in wafer processing to post processing in semiconductor manufacturing including photoresists*1, photolithography-related materials, CMP slurries*2, post-CMP cleaners*3, thin-film chemicals*4 and polyimides*5, as well as WAVE CONTROL MOSAIC™*6 which includes color filter materials for image sensors. In addition to its extensive product lineup covering almost the entire range of semiconductor manufacturing processes, from leading-edge to legacy semiconductors, Fujifilm is committed to solving customers' issues by providing one-stop solutions that leverage its global supply structure with 20 locations and advanced R&D capabilities. At the same time, the company is making aggressive capital investments in production facilities globally, and is expanding production capacity and local production of semiconductor materials.

The semiconductor-related market in India is expected to grow to 64 billion dollars by 2026, about three times the size of 2019, due to the government's focus on fostering the semiconductor industry*7.
Through its participation in “SEMICON India”, Fujifilm will accelerate the development and provision of semiconductor materials that meet customer needs and contribute to the development of the semiconductor industry in India by further strengthening its business base in the Indian market.

• * WAVE CONTROL MOSAIC is a registered trademark or trademark of FUJIFILM Corporation.
• *1 Material used to coat wafer substrate when circuit patterns are drawn in the process of semiconductor manufacturing
• *2 A polisher for evenly levelling semiconductor surface, which contains a mixture of wires and insulation films of varying hardness.
• *3 Cleaners used after polishing with CMP slurry to remove particles, minute metal fragments and organic residues while protecting the metal surface
• *4 Materials for forming low-dielectric insulation films
• *5 A material with strong heat resistance and insulation properties, used for forming semiconductors’ protective films and rewiring layer
• *6 General term referring to a group of functional materials for controlling electromagnetic light waves in a broad range of wavelengths, including photosensitive color materials for manufacturing color filters for image sensors such as CMOS sensors, used in digital cameras and smartphones
• *7 According to “Expectations for Experience and Knowledge of Japanese Companies: Exploring the Present State of India's First Semiconductor Manufacturing (4)” by Japan External Trade Organization

Overview of “SEMICON India 2024”

Learn more about “SEMICON India 2024”

Contact

Media Contact

FUJIFILM Holdings Corporation
Coprorate Communications Division,
Public Relations Group
+81-3-6271-2000

Customer Contact

FUJIFILM Corporation
Electronic Materials Business Division
+81-45-534-8824

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